We have investigated the emission of positive ions from metallic targets irradiated with intense, ultrashort laser pulses (approximate to 120 fs) at 780 nm, in both S and P polarized states. The measured energy spectra show the presence of a nonthermal, high-energy (several keV) ion component accompanying low-energy ions (tens of eV) produced by a thermal mechanism. The yield of the high-energy component shows a strong dependence on both laser fluence and light polarization. For the low-energy component a higher ablation efficiency was observed for P polarization, and ascribed to a more effective absorption mechanism active during the laser-target interaction. (C) 2000 American Institute of Physics. [S0003-6951(00)02549-3].

Thermal and nonthermal ion emission during high-fluence femtosecond laser ablation of metallic targets / Amoruso, Salvatore; X., Wang; Altucci, Carlo; DE LISIO, Corrado; M., Armenante; Bruzzese, Riccardo; Velotta, Raffaele. - In: APPLIED PHYSICS LETTERS. - ISSN 0003-6951. - STAMPA. - 77:23(2000), pp. 3728-3730. [10.1063/1.1329869]

Thermal and nonthermal ion emission during high-fluence femtosecond laser ablation of metallic targets

AMORUSO, SALVATORE;ALTUCCI, CARLO;DE LISIO, CORRADO;BRUZZESE, RICCARDO;VELOTTA, RAFFAELE
2000

Abstract

We have investigated the emission of positive ions from metallic targets irradiated with intense, ultrashort laser pulses (approximate to 120 fs) at 780 nm, in both S and P polarized states. The measured energy spectra show the presence of a nonthermal, high-energy (several keV) ion component accompanying low-energy ions (tens of eV) produced by a thermal mechanism. The yield of the high-energy component shows a strong dependence on both laser fluence and light polarization. For the low-energy component a higher ablation efficiency was observed for P polarization, and ascribed to a more effective absorption mechanism active during the laser-target interaction. (C) 2000 American Institute of Physics. [S0003-6951(00)02549-3].
2000
Thermal and nonthermal ion emission during high-fluence femtosecond laser ablation of metallic targets / Amoruso, Salvatore; X., Wang; Altucci, Carlo; DE LISIO, Corrado; M., Armenante; Bruzzese, Riccardo; Velotta, Raffaele. - In: APPLIED PHYSICS LETTERS. - ISSN 0003-6951. - STAMPA. - 77:23(2000), pp. 3728-3730. [10.1063/1.1329869]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11588/454754
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