As a result of short-circuit (SC) stress tests, few commercial 1.2 kV SiC MOSFETs feature fail-to-open (FTO) behavior, that is, a permanent short-circuit between gate and source terminals, even at drain-source bias voltages as high as 600 V. Such devices are very interesting from an application point of view, since such failure mode enables implementation of hopping-home functionality at a nominal operational voltage and have thus been investigated in depth. This work delivers incremental and complementary understanding on the very timely and highly application-relevant topic of short-circuit withstand capability, aging and failure-mode of SiC power MOSFETs, pointing out new effects and dependence of the degradation state on the bias conditions during test.

Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs / Richardeau, F.; Borghese, A.; Castellazzi, A.; Irace, A.; Chazal, V.; Guibaud, G.. - (2021), pp. 255-258. ( 2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD) Nagoya, Japan 2021) [10.23919/ispsd50666.2021.9452253].

Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs

Borghese, A.
;
Castellazzi, A.;Irace, A.;
2021

Abstract

As a result of short-circuit (SC) stress tests, few commercial 1.2 kV SiC MOSFETs feature fail-to-open (FTO) behavior, that is, a permanent short-circuit between gate and source terminals, even at drain-source bias voltages as high as 600 V. Such devices are very interesting from an application point of view, since such failure mode enables implementation of hopping-home functionality at a nominal operational voltage and have thus been investigated in depth. This work delivers incremental and complementary understanding on the very timely and highly application-relevant topic of short-circuit withstand capability, aging and failure-mode of SiC power MOSFETs, pointing out new effects and dependence of the degradation state on the bias conditions during test.
2021
978-4-88686-422-2
Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs / Richardeau, F.; Borghese, A.; Castellazzi, A.; Irace, A.; Chazal, V.; Guibaud, G.. - (2021), pp. 255-258. ( 2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD) Nagoya, Japan 2021) [10.23919/ispsd50666.2021.9452253].
File in questo prodotto:
File Dimensione Formato  
ric21_Effect_of_gate-source_bias.pdf

accesso aperto

Tipologia: Versione Editoriale (PDF)
Licenza: Copyright dell'editore
Dimensione 1.49 MB
Formato Adobe PDF
1.49 MB Adobe PDF Visualizza/Apri

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11588/1005079
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 11
  • ???jsp.display-item.citation.isi??? 6
social impact